Objective Questions on Nano Electronics

Solapur-University-M.Sc. – Electronics (Semester-IV)-2019-On Nanoelectronics

Sr. No Questions with multiple options
1. In ________ lithography, a film of water or another dielectric medium is inserted in between the lens and wafer.

(a)    Optical

(b)   Electron beam

(c)    Immersion

(d)   Ultraviolet

2. The superlattice consists of a _____ set of Multiple Quantum Well (MQW).

(a)    Irregular

(b)   Regular

(c)    Periodic

(d)   None of these

3. The transistor having 100 nm dimensions obeys _____ principles.

(a)    Quantum

(b)   Classical physics

(c)    Both a and b

(d)   None of these

4. The parabolic as well as square well wave functions solutions are ____ due to the symmetry of the potential well.

(a)    Symmetric or antisymmetric

(b)   Sine functions

(c)    Neither asymmetric

(d)   Cosine functions

5. The transistor based on hot electron is called ____ transistor

(a)    Hot hole

(b)   Hot

(c)    Hot electron

(d)   Electron

6. The energy spectrum in case of 0DEG system is totally _____

(a)    Diverges

(b)   Discrete

(c)    Parabolic

(d)   Staircase

   
7. The synonym of MODFET is ______

(a)    Modulation doped FET

(b)   Modulation oxide doped FET

(c)    Modulation oxide FET

(d)   Modulation oxide doped FET

8. The operation of negative differential resistor (NDR) quantum well electron device is based on ____

(a)    Quantum confined stark effect

(b)   Resonant tunnel effect

(c)    Both a and b

(d)   None of these

9. The OLED’s are an electroluminescent organic material between two ___ of different work functions.

(a)    Semiconductors

(b)   Nonconductors

(c)    Insulator

(d)   Conductors

10. In case of Type II multiple quantum well (MQW) the wells for hole and electron are located in the __________ space location.

(a)    Alternate

(b)   Same

(c)    Different

(d)   Triangular

11. The spilt gate technique is used to _____ the electron gas dimensionality

(a)    Increase

(b)   Decrease

(c)    Equal

(d)   None of the above

12. For a _____ photoresist, the resist material is initially soluble and through a chemical reaction when exposed to light it become insoluble.

(a)    Positive

(b)   Negative

(c)    Lithography

(d)   IC

   
  Data Collected By – K. Jeyanthi
  Published on – 20th Nov 2021
   

 


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