Solapur University M.Sc Nano Technology (Semester-IV) Paper on Thin Film Technology March 2019
| Sr. No. | Question |
| 1 | 1 Torr is equal to ________
(a) 133.28 Pa (b) 133.28 N per sq. meter (c) Both (a) & (b) (d) None of the above |
| 2 | Thickness of thin film in the range of ___________
(a) Nm (b) Micro meter (c) Several nm to several mm (d) Several nm to several micro meter |
| 3 | Sticking coefficient is the ratio of _________
(a) No. of adsorbed atom to total No. of imping atom (b) No. of absorbed atom to total No. of imping atom (c) No. of adsorbed atom to total No. of desorbed atom (d) None of the above |
| 4 | Surface diffusion takes place in ___________
(a) CVD (b) PVD (c) Both (a) & (b) (d) None of the above |
| 5 | ____________parameter effect on Thin film formation in Thermal evaporation
(a) Temperature (b) Concentration (c) PH (d) Density |
| 6 | ____________is positive displacement vacuum pump
(a) Rotary pump (b) Diffusion pump (c) Turbo molecular pump (d) None of the above |
| 7 | Sputter yield depends on __________
(a) The energy of the incident ions (b) The masses of the ions (c) The binding energy of atoms (d) All of the above |
| 8 | DC sputtering works with all __________target material
(a) Insulating (b) Conducting (c) Both (a) & (b) (d) None of the above |
| 9 | In MOCVD precursor is _________
(a) Metal oxide (b) Metal organic (c) Metal salt (d) Metals |
| 10 | ____________technique is suitable for layer by layer thin film decomposition
(a) MBE (b) CVD (c) Thermal evaporation (d) All of the above |
| 11 | Usually thin films are _____
(a) 1D (b) 2D (c) 3D (d) 0D |
| 12 | ___________used for glass substrate cleaning
(a) Alcohol (b) Acetone (c) Chromic acid (d) All of the above |
| Published on 2nd Oct 2021 | |
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